Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment
In: Applied Physics Letters, Jg. 58 H. 23, S. 2601-2603
Fabrication and characterization of Si-based soft x-ray mirrors
In: X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography, Jg. 1343, S. 64-72Interface Stability and Silicide Formation in High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and [...]
In: Physica status solidi A: applications and materials science, Jg. 145 H. 2, S. 539-550Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity
In: Applied Physics Letters, Jg. 63 H. 16, S. 2207-2209Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment
In: Thin Solid Films, Jg. 228 H. 1-2, S. 154-157Spin-polarized LEED from Xe-Pt(111)
In: Vacuum, Jg. 41 H. 1-3, S. 325-327Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation
In: Applied Physics A: Materials Science and Processing, Jg. 58 H. 4, S. 371-376